Sample cleaning using Ar-GCIS

Typical samples are often presented for analysis following transportation in a less than ideal environment. This results in an analysis and measured surface composition that is not representative of the true surface of the original material. There are a limited number of methodologies available that can effectively clean the sample and restore the original surface without inducing some additional chemical changes and thereby changing the very surface that is being investigated. The development of Ar-gas cluster ion source has changed this.